JPH0212376B2 - - Google Patents
Info
- Publication number
- JPH0212376B2 JPH0212376B2 JP59235831A JP23583184A JPH0212376B2 JP H0212376 B2 JPH0212376 B2 JP H0212376B2 JP 59235831 A JP59235831 A JP 59235831A JP 23583184 A JP23583184 A JP 23583184A JP H0212376 B2 JPH0212376 B2 JP H0212376B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- electron
- electron gun
- section
- wehnelt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 description 36
- 238000000137 annealing Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 238000009826 distribution Methods 0.000 description 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 6
- 239000013078 crystal Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59235831A JPS61114449A (ja) | 1984-11-08 | 1984-11-08 | 電子銃 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59235831A JPS61114449A (ja) | 1984-11-08 | 1984-11-08 | 電子銃 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61114449A JPS61114449A (ja) | 1986-06-02 |
| JPH0212376B2 true JPH0212376B2 (en]) | 1990-03-20 |
Family
ID=16991903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59235831A Granted JPS61114449A (ja) | 1984-11-08 | 1984-11-08 | 電子銃 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61114449A (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2526303B2 (ja) * | 1990-05-16 | 1996-08-21 | 株式会社日立製作所 | リニアフィラメント型電子銃 |
| KR101420244B1 (ko) | 2008-05-20 | 2014-07-21 | 재단법인서울대학교산학협력재단 | 전자빔 집속 전극 및 이를 이용한 전자총 |
-
1984
- 1984-11-08 JP JP59235831A patent/JPS61114449A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61114449A (ja) | 1986-06-02 |
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